How does the plasma equipment RF horizontal electrode capacitive coupling discharge work?
According to the different power supply choices, there are generally two types of intermediate frequency and radio frequency. Due to the different discharge forms of radio frequency plasma equipment, there are also two types of radio frequency capacitive coupling and inductive coupling discharge. We will introduce radio frequency and the compatible coupling discharge of horizontal electrodes. Form and basic principles.

1. What is RF:
RF means that the working frequency of plasma equipment is on the order of MHz, and the typical band of RF plasma equipment is 13.56MHz. Capacitively coupled radio frequency is widely used in the application of surface plasma cleaning of materials.
2. Basic principles:
There are many mechanisms for generating low-temperature plasma in plasma equipment, including but not limited to DC glow discharge, radio frequency induction discharge, capacitive coupling radio frequency discharge, etc. Among them, the radio frequency discharge of the capacitive coupling horizontal electrode plate is due to the large processing area. It is widely used in many scientific research and industrial processes.
For a capacitively coupled high-frequency plasma source, the plasma held between parallel electrodes is mainly heated by a high-frequency electric field. Most capacitively coupled RF plasma reactors are non-magnetized, and the operating frequency is between 1 and 100 MHz. The charge response to the electromagnetic field is lower than that of the electron plasma reactor, that is, ω<ωpe. The non-magnetized capacitive coupling radio frequency discharge model uses compatible coupling radio frequency discharge to generate a large area of stable plasma. Therefore, as mentioned above, the capacitive discharge of plasma equipment has become a plasma widely used in low-pressure discharge material processing. source.