What kind of plasma cleaning should be used for dry cleaning of wafers in plasma cleaning equipment:
Wafer cleaning is divided into wet cleaning and dry cleaning. Plasma cleaning belongs to dry cleaning. Contaminants on the wafer surface are invisible to the naked eye and require plasma cleaning to remove them. Which equipment should be used for dry cleaning of wafers? You deserve to own the vacuum plasma cleaning equipment made by Chengfeng Zhizhi.

Requirements for cavity and bracket:
Plasma cleaning of wafers is carried out in a clean room with a level of 1,000 or more. The requirements for wafers are very high. If there are any unqualified wafers on the wafers, it will cause irreparable defects. Therefore, the cavity of the plasma cleaning equipment must first be aluminum, not stainless steel; the sliding part of the support for the wafer should be made of materials that are not prone to dust and plasma corrosion; the electrode and the support are removed to facilitate daily maintenance.
The electrode spacing and number of layers, as well as the requirements for gas path distribution:
Parameters such as the electrode spacing, number of layers, and gas path distribution in the reaction chamber of the plasma cleaning equipment have an important impact on the uniformity of wafer processing. These indicators need to be continuously tested and optimized.
Requirement of electrode plate temperature:
During the plasma cleaning process, a certain amount of heat will be accumulated. When the process requires it, the electrode plates must be kept within a certain temperature range. Therefore, the electrodes after plasma cleaning are generally cooled by adding water.
Tips for placing:
The multi-layer plasma cleaning equipment has a high production capacity. It can place multiple wafers on each layer of the support as needed. It is more suitable for semiconductor discrete devices, power electronic components dedicated 4-inch, 6-inch wafers, etc. .
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